ASML Holding N.V.High-NA EUV production milestone and plans for broader adoption
Intel and ASML have announced that more than one million wafers have been processed using High-NA EUV lithography, marking a significant step toward commercial manufacturing. The technology is being used for select layers of Intel's Core Ultra Series 3 processors, code-named Panther Lake, produced on Intel 18A, and the companies report that performance meets or exceeds comparable layers patterned using the NXE platform. ASML plans to pilot larger-format masks by 2031 and have the technology ready for high-volume production by 2033, with collaboration from major customers like TSMC and Samsung. Intel's Q2 2026 report revealed a revenue of $16.1 billion, a 25% increase year-over-year, but its foundry business still posted an operating loss of $2.1 billion, with only $293 million of quarterly revenue from external customers. While the milestone boosts confidence in High-NA adoption, Intel must prove it can convert manufacturing progress into profitable external foundry business, and ASML faces the challenge of broader customer adoption over time.
ASML Holding N.V.High-NA EUV production milestone and plans for broader adoption
Intel CorporationHigh-NA EUV milestone for Panther Lake processors on Intel 18A
Taiwan Semiconductor Manufacturing Co. Ltd.
Samsung Electronics Co Ltd
Apple Inc.