ASML Expands High-NA EUV Ties With Samsung and Intel

Product / TechM&A · PartnershipIndustry Impact 4
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Summary · why it matters

ASML Holding NV is expanding its High-NA EUV customer collaborations with Samsung Electronics and Intel as AI-related chip demand raises manufacturing complexity. On Tuesday, ASML expanded its long-standing partnership with Samsung around High-NA EUV and advanced semiconductor manufacturing, and that same day extended its collaboration with Intel on future scaling needs, including larger-format masks. Intel has already moved High-NA into production, helping Intel Foundry in Panther Lake production and qualifying the technology on select 18A product layers, which ASML's second-quarter presentation described as a new readiness milestone. Samsung is joining an industry initiative to develop a 12-inch photomask platform for High-NA EUV and plans to introduce ASML's High-NA technology into future DRAM high-volume manufacturing by 2028. In the first quarter of 2026, the High-NA platform had processed more than 0.5 million wafers and achieved availability above 80%, while ASML expects advanced foundry Logic revenue to rise about 25% in 2026, Memory revenue to increase 75% and EUV revenue to grow about 45%. Management still expects discussions with all customers on exactly how and when High-NA will enter high-volume manufacturing, leaving the pace of wider adoption dependent on customer qualification and manufacturing decisions.

Impact on stocks 4

Semiconductors · 2 stocks
ASML Holding N.V.
ASML
▲ PositiveDemandrelevance

ASML expanded High-NA EUV collaborations with Samsung and Intel, with advanced foundry Logic revenue expected to rise ~25% and Memory revenue 75% in 2026.

Intel Corporation
INTC
▲ PositiveTechnologyrelevance

ASML extended its High-NA EUV collaboration with Intel, which has moved High-NA into production for Panther Lake and qualified it on 18A layers.

Artificial Intelligence · 1 stocks
Samsung Electronics Co Ltd
005930
▲ PositiveTechnologyrelevance

ASML expanded its High-NA EUV partnership with Samsung, which will adopt the tech for future DRAM high-volume manufacturing by 2028.

Others · 1 stocks
Samsung Electronics Co Ltd
005930
▲ PositiveTechnologyrelevance

Samsung is joining an industry initiative for a 12-inch photomask platform and plans to introduce ASML's High-NA technology into DRAM production by 2028.

Theme Impact 6

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