ASML Holding N.V.ASML's High NA EUV systems received commitments from TSMC and Samsung, boosting sales outlook.
ASML Holding NV rose 2.91% in premarket trading after Taiwan Semiconductor Manufacturing Co. and Samsung Electronics committed to its High NA EUV lithography systems, which cost about $400 million each. TSMC, which had previously been cautious about the cost, will begin using the systems in 2030, while Samsung will start in 2028 for memory production, joining Intel Corp. TSMC alone accounts for roughly 16% of ASML's revenue, according to Bloomberg data. The companies also agreed to shift photomasks from the 6-inch standard to 12-inch versions, a change that ASML's chief technology officer Marco Pieters said could boost High NA throughput by 40%. TSMC and ASML plan a test line for 12-inch masks by 2031, with production use on High NA tools by 2033.
ASML Holding N.V.ASML's High NA EUV systems received commitments from TSMC and Samsung, boosting sales outlook.
Taiwan Semiconductor Manufacturing Co. Ltd.TSMC committed to use ASML's High NA EUV systems starting in 2030, and TSMC accounts for ~16% of ASML's revenue.
Intel Corporation
Samsung Electronics Co LtdSamsung committed to use ASML's High NA EUV systems for memory production starting in 2028, indicating strong demand.
Samsung Electronics Co LtdSamsung committed to use ASML's High NA EUV systems for memory production starting in 2028, indicating strong demand.