ASML Holding N.V.ASML's High-NA systems are being adopted by major chipmakers, and the larger mask format could increase throughput by 40%, boosting demand.
ASML Holding gained about 2% on Tuesday as investors assessed progress by major chipmakers toward adopting its newest High-NA extreme ultraviolet lithography systems. Samsung Electronics, Taiwan Semiconductor Manufacturing, and Intel are moving forward with plans to use the advanced equipment, and are also working with ASML on a shift from six-inch photomasks to a 12-inch format. ASML said the larger masks could raise High-NA system throughput by as much as 40%, helping chip manufacturers improve production efficiency as demand for processors used in artificial intelligence applications expands. The companies are also taking a longer-term approach: Taiwan Semiconductor Manufacturing and ASML plan to establish a 12-inch mask test line by 2031, with commercial manufacturing targeted for 2033. ASML Chief Technology Officer Marco Pieters said the larger mask format could support higher productivity from High-NA equipment, with Intel and Samsung Electronics also participating in the development effort.
ASML Holding N.V.ASML's High-NA systems are being adopted by major chipmakers, and the larger mask format could increase throughput by 40%, boosting demand.
Taiwan Semiconductor Manufacturing Co. Ltd.TSMC is adopting High-NA systems and collaborating with ASML on a 12-inch mask test line, enhancing its production capabilities.
Intel CorporationIntel is adopting ASML's High-NA systems and participating in the 12-inch mask development, which could improve its chipmaking efficiency.
Samsung Electronics Co LtdSamsung is moving forward with plans to use ASML's High-NA systems and is involved in the larger mask format development.
Samsung Electronics Co LtdSamsung is participating in the High-NA adoption and mask development, which could improve its manufacturing efficiency.