ASML Holding N.V.ASML announced commitments from Samsung, TSMC, and Intel for its High-NA EUV equipment, strengthening outlook.
ASML Holding announced that Samsung Electronics, Taiwan Semiconductor Manufacturing, and Intel are moving forward with its latest High-NA extreme ultraviolet lithography equipment, strengthening the outlook for next-generation AI chips. Samsung plans to begin using High-NA systems for computer memory by 2028, while TSMC will adopt the technology from 2030, and Intel Foundry continues to use it in high-volume manufacturing. The companies are also collaborating with ASML on a shift from 6-inch to 12-inch photomasks, which could improve productivity and lower costs. ASML's chief technology officer, Marco Pieters, said the larger masks could increase High-NA machine throughput by 40 percent. TSMC's adoption is particularly significant as it accounts for about 16 percent of ASML's revenue, according to Bloomberg data.
ASML Holding N.V.ASML announced commitments from Samsung, TSMC, and Intel for its High-NA EUV equipment, strengthening outlook.
Taiwan Semiconductor Manufacturing Co. Ltd.TSMC will adopt High-NA technology from 2030, and its adoption is significant as it accounts for 16% of ASML's revenue.
Intel CorporationIntel Foundry continues to use High-NA systems in high-volume manufacturing, indicating ongoing adoption.
Samsung Electronics Co LtdSamsung plans to begin using High-NA systems for computer memory by 2028, committing to the new equipment.
Samsung Electronics Co LtdSamsung plans to begin using High-NA systems for computer memory by 2028, committing to the new equipment.